deep trench isolation
由MForsberg著作·2004·被引用6次—Deeptrenches,usuallywithadepthlargerthanacoupleofmicrometers,aremainlyusedtoisolatedifferentdevicesanddevicegroups(wells)inCMOS/.BiCMOS ...,Theexperimentshowsthatdeeptrenchtechnologyiscapabletopromotetheperformanceo...
深槽技術於CMOS 共平面波導與晶片隔絕度之應用
- sti淺溝槽
- locos sti比較
- shallow trench isolation半導体
- shallow trench isolation半導体
- shallow trench isolation中文
- sti locos
- shallow trench isolation半導體
- sti etch back
- corner rounding半導體
- deep trench isolation process
- pad oxide半導體
- shallow trench isolation解釋
- hump effect
- sti divot
- pad oxide半導體
- cmos sti
- shallow trench isolation 用途
- 淺溝渠隔離
- ild半導體
- sti etch back
- hump effect
- sti usg
- cmos sti
- deep trench isolation
- 屏蔽氧化層
Theexperimentshowsthatdeeptrenchtechnologyiscapabletopromotetheperformanceofcoplanarwaveguideprofoundly.Besidesthe.CPW,thetechniquewas ...
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